annealed condition造句

"annealed condition"是什么意思   

例句与造句

  1. Orthogonal test method of annealing conditions for relaxor ferroelectric ceramics
    弛豫铁电陶瓷最佳退火条件的正交试验法
  2. Influence of annealing conditions on stress impedance effect of fecunbsib amorphous alloy strip
    非晶带材应力阻抗效应的影响
  3. The best annealing condition of the zno films grown by electron beam evaporation technique was achieved
    采用电子束蒸发的方法在si衬底上生长zno薄膜,通过退火实验,得到了最佳的退火条件。
  4. With sem , x - ray diffraction analysis , magnetic measurement by magnetic property measurement system , the effects of growth and annealing conditions are analyzed
    超导薄膜,采用磁测量m - t x射线衍射扫描电子显微镜技术分析了各种沉积及退火条件对mgb
  5. The difficulty can be overcomed that the n atom is not easy to be doped into zno . if we control the annealing condition , the residual nitrogen atoms will become acceptors in zno : n films
    通过这种方法可以克服n原子不容易惨杂进氧化锌的困难,并且可以通过控制退火过程来控制n原子< wp = 5 >的掺杂浓度。
  6. It's difficult to find annealed condition in a sentence. 用annealed condition造句挺难的
  7. The main work includes three contents as followings : 1 , the situation of ohmic contact about al electrode , ti / al electrode on n - gan in different annealing conditions are investigated
    主要工作如下: 1 、研究了al单层及ti al双层电极与n型gan在不同退火条件下的欧姆接触情况,并用挖补圆盘法计算出接触电阻率。
  8. The effect of annealing condition such as temperature , time and vacuum on microstructure of vo2 films was studies . the crystalline vo2 films can be obtained after annealing at 450 3 hour in 10pa vacuum . the conductivity of films increases linearly with increasing the temperature
    对退火温度和时间以及真空度的影响进行了研究,在低真空( 10pa ) 450退火3小时后得到的vo _ 2薄膜,晶体颗粒呈长方柱状,具有良好的结晶性能。
  9. In this paper , we implanted mn + ion of different dose into undoped semi - insulating ( 100 ) gaas substrate then performed rapid thermal annealing in different temperature and time . studied the different annealing condition dependence of the samples " structure , electrical and magnetic properties and the relation of the mn + forms and these properties
    本课题采用离子注入的方法将不同剂量的mn ~ +注入到非掺杂半绝缘( 100 ) gaas单晶衬底中,然后进行不同温度和时间的快速热退火处理,研究了不同的退火条件对样品注入层的晶体结构、电特性和磁特性的影响以及mn ~ +在样品中的存在状态与这些性质之间的关系。
  10. The main work in this thesis includes two contents as follow : 1 we have investigated the properties of ohmic contact between metal electrode ( al and ti / al electrode ) and n - gan dealed under different annealing conditions . by using xrd sims analytic methods and i - v measuremnet , we analysed the interface between metals and gan , and suggested that it is effect to decrease the value of the ohmic contact
    主要工作如下: 1 、研究了al单层及ti al双层电极与n型si基gan和al _ 2o _ 3基gan在不同退火条件下的欧姆接触情况,并用x射线衍射谱( xrd ) ,二次离子质谱( sims )对界面固相反应进行了分析。
  11. The test results show that the grain sizes do not reduce further after 6 passes of ecap , the slip systems of ferrite is mainly belonging to { 110 } < 111 > and { 112 } < 111 > slip system family during the first and the second pass of the ecap with route c , and under the annealing conditions of 300 ~ 550 x lh , ultrafme grains are thermally stable
    研究发现,在c方式ecap变形中,各道次ecap变形细化程度不同, 1道次细化效果最大,随后道次细化作用逐步减少,变形6道次为实验用钢的ecap晶粒细化的极限。铁素体c方式ecap变形第1和第2道次的主要滑移系为{ 110 } < 111 >和{ 112 } < 111 > 。
  12. Secondly , the radiation effects of the system of silicon gate si / sio2 ( silicon gate nmos and pmos ) implanted bf2 are made a deep systematic study . especially , the relationship between threshold voltage shift ( vth and vit vot ) in radiated mos transistor and irradiation dose rate , irradiation dose , irradiation temperature , bias voltage , device structure as well as annealing condition is explored emphatically
    在此基础上,对bf _ 2 ~ +注入硅栅si sio _ 2系统低剂量率辐照效应进行了深入系统的研究,着重研究了bf _ 2 ~ -注入mos管阈值电压漂移( vth和vit 、 vot )与辐照剂量率、辐照总剂量、辐照温度、偏置电场、器件结构以及退火条件的依赖关系。

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